Thin film deposition and etching
Modern semiconductor processing techniques such as DRIE, ALD, PVD, CVD, ALE, etching and deposition require fast control of various gases
How our sensors make a difference
Clean processing
For clean surface processing of wafers with DRIE (deep reactive ion etching), different process gases have to be changed at high speed. The fast response time of Sensirion mass flow controllers increases the quality of these processes.
High process speed
When processing wafers with DRIE (deep reactive ion etching), different process gases have to be changed at high speed. The fast response time of our MFCs increases the speed of these processes.
Long-term stability
Due to the high long-term stability, systems do not have to be stopped to recalibrate the mass flow controllers.
Why Sensirion should be part of your solution
Rely on the fastest mass flow controllers on the market
The implementation of Sensirion mass flow controllers in surface coating and treatment processes ensures high surface quality at high process speeds.
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Want more detailed information?
Download our onepager on thin film deposition – stable and precise control of gases during deposition processes – for free.
Want more detailed information?
Download our onepager on thin film deposition – stable and precise control of gases during deposition processes – for free.
Thin film deposition onepager
