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For industrial and semiconductor applications
Gas purging is the process of displacing unwanted gases or contaminants with an inert gas, typically nitrogen (N₂), to provide ultra-clean environments essential for semiconductor fabrication. Some key applications include:
Ensuring that wafers remain uncontaminated by maintaining a controlled nitrogen environment in FOUPs (Front Opening Unified Pods) and storage chambers.
Precisely controlling gas flows during deposition cycles to create uniform and defect-free thin films notably also used in battery manufacturing, where it plays a role in improving the performance and longevity of battery components.
Purging residual reactive gases from etching and deposition chambers to prevent cross-contamination and extend equipment longevity.
Sensirion’s digital mass flow controllers offer high accuracy, fast response times, and multi-gas calibration, making them an optimal choice for semiconductor and industrial gas purging applications. Here’s why:
Download our onepager on gas purging for free.
Download our onepager on gas purging for free.