For industrial and semiconductor applications

The role of gas purging in semiconductor manufacturing

Gas purging is the process of displacing unwanted gases or contaminants with an inert gas, typically nitrogen (N₂), to provide ultra-clean environments essential for semiconductor fabrication. Some key applications include:

Wafer storage purging

Ensuring that wafers remain uncontaminated by maintaining a controlled nitrogen environment in FOUPs (Front Opening Unified Pods) and storage chambers.

Atomic layer deposition (ALD)

Precisely controlling gas flows during deposition cycles to create uniform and defect-free thin films notably also used in battery manufacturing, where it plays a role in improving the performance and longevity of battery components.

Process chamber cleaning

Purging residual reactive gases from etching and deposition chambers to prevent cross-contamination and extend equipment longevity.

Why Sensirion should be part of your solution

Sensirion’s digital mass flow controllers offer high accuracy, fast response times, and multi-gas calibration, making them an optimal choice for semiconductor and industrial gas purging applications. Here’s why:

Precision and stability

Digital multi-gas calibration

Flexibility in configuration

Best-in-class time response for ALD and other applications

Compact design with high performance

Industry-ready communication interfaces

Active 5

SFC5500

Versatile mass flow controller, via online distribution

Active

SFC6000D-20slm

Best price-performance ratio, distribution version, 20 slm

  • Sensor
  • Mass flow controllers
Active

SFC6000D-50slm

Best price-performance ratio, distribution version, 50 slm

  • Sensor
  • Mass flow controllers
Active

SFC6000D-5slm

Best price-performance ratio, distribution version, 5 slm

  • Sensor
  • Mass flow controllers

Want more detailed information?

Download our onepager on gas purging for free.

Want more detailed information?

Download our onepager on gas purging for free.