Fast control speed for wide dynamic range
Modern semiconductor processing techniques such as vacuum deposition and DRIE (deep reactive ion etching) require fast control of various gases.
Clean processing
For clean surface processing of wafers with DRIE (deep reactive ion etching), different process gases have to be changed at high speed. The fast response time of Sensirion mass flow controllers increases the quality of these processes.
High process speed
When processing wafers with DRIE (deep reactive ion etching), different process gases have to be changed at high speed. The fast response time of our MFCs increases the speed of these processes.
Long-term stability
Due to the high long-term stability, systems do not have to be stopped to recalibrate the mass flow controllers.
Discover how Sensirion contributes to the solution.
Fast mass flow controller
Leading suppliers in the field of semiconductor processing using DRIE have for years relied on Sensirion’s fast, highly accurate and reliable mass flow controllers.
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